Maskless Direct Etching Technique Using Focused Ion Beams (FIB)
- researcher's name
- research field
Nuclear engineering,Particle/Nuclear/Cosmic ray/Astro physics,Physical chemistry
■Nanoscale Mircofabrication of Cross-linked PTFE Using Focused Ion Beams (FIB)
The representative compound, flourine resin polytetrafluoroethylene (PTFE), has superior heat resistance and chemical resistance properties, and these superior properties are harnessed for various industry applications. In recent years, a cross-linked PTFE with superior abrasion resistance and radiation resistance properties has been developed, and as its new application, microfabrication products have been fabricated using synchrotron radiation (SR). The microfabrication of cross-linked PTFE by SR allowed for high aspect ratio and sharp processing. On the other hand, problems included the reliance of processing accuracy on mask accuracy in the case of nanoscale microfabrication.
This research attempts to carry out maskless direct etching using focused ion beams (FIB) in order to study the nanoscale microfabrication of cross-linked PTFE. An image of the fabricated microscopic structure FE-SEM is shown in a diagram.
Research will be conducted on the miniaturization of the processing scale, functionalization of microfabricated materials, and the transcription of micropatterns.
Achievement of microscopic processing scale and stable processing accuracy.
purpose of providing seeds
Sponsord research, Collaboration research, Technical consultation
Affiliation: Japanese Society of Radiation Chemistry; The Physical Society of Japan; The Chemical Society of Japan; The Society of Polymer Science, Japan; Atomic Energy Society of Japan; RadTech Japan
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