表題番号：2015K-193
日付：2016/04/01
研究課題シリコン基板をシリカ源とするメソポーラスシリカ薄膜の作製
| 研究者所属（当時） | 資格 | 氏名 | |
|---|---|---|---|
| （代表者） | 理工学術院 先進理工学部 | 教授 | 黒田 一幸 |
- 研究成果概要
- Techniques of single nanometer-scale patterning are required for fabrication of higher-density integrated circuits and memories. However, single nanometer-scale patterning remains challenging even today because such an extremely short pitch cannot be fabricated by the conventional nanopatterning techniques such as photolithography. Expensive mask and photosensitive polymer are also required for photolithography processes. We have succeeded in fabricating silica-based materials with nanogroove structures at the interfaces between Si substrates and lyotropic liquid crystals using soluble silicate species generated from Si substrates under basic conditions. Cationic surfactants were coated on Si substrates. The substrates were exposed to aqueous ammonia vapor and they were washed to remove the surfactants. A thin layer on Si substrates with an ordered semicircle groove structure, the periodicity and depth of which are around 5 nm and 2 nm, respectively, was observed.