The new interface measuring device using new plasmon sensor and raman scattering spectroscopy

2016-0203-05
researcher's name
about researcher HOMMA, Takayuki Professor
affiliation
Faculty of Science and Engineering School of Advanced Science and Engineering Department of Applied Chemistry
research field
Nano/Microsystems,Functional solid state chemistry,Electron device/Electronic equipment
keyword

background

● Non-destructive depth profile analysis,  is difficult
● High-precision nondestructive inspection is difficult
● Complicated operations of large measurement equipment.

summary

● Molecular configuration at buried interface, i.e. solid / liquid, Chemical structure change of the atomic level, are simply measured in nanometer scale.

predominance

● Depth-resolution 0.1nm or less (More than 10 times of the present sensitivity)
● High-precision nondestructive inspection,low cost and high measurement convenience

application/development

● High-density optical recording multilayer film, a variety of devices, i.e. magnetic disks or semiconductors, Li ion battery, fuel cell, vital reaction, and so on.

material

  • Example of buried interface
  • New Plasmon sensor which enhances SERS effect effectively
  • Depth direction profile of the G peak strength of the graphite

same researcher's seeds

  • Electroforming Technique using Self-assembled Monolayer(SAM) for Modified Nanopatterns
  • The New Interface Measuring Device using New Plasmon Sensor　and Raman Scattering Spectroscopy
  • Mold manufacturing method and the molds formed using the method
posted: 2016/02/03